Spectral Purity Filters for Use in a Lithographic Apparatus
According to an aspect of the present invention, a spectral purity filter includes an aperture, the aperture being arranged to diffract a first wavelength of radiation and to allow at least a portion of a second wavelength of radiation to be transmitted through the aperture, the second wavelength of...
Saved in:
Main Authors | , , , , |
---|---|
Format | Patent |
Language | English |
Published |
28.01.2010
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Summary: | According to an aspect of the present invention, a spectral purity filter includes an aperture, the aperture being arranged to diffract a first wavelength of radiation and to allow at least a portion of a second wavelength of radiation to be transmitted through the aperture, the second wavelength of radiation being shorter than the first wavelength of radiation, wherein the aperture has a diameter greater than 20 mum. |
---|---|
Bibliography: | Application Number: US20090500198 |