MODEL-BASED SCANNER TUNING SYSTEMS AND METHODS

Systems and methods for tuning photolithographic processes are described. A model of a target scanner is maintained defining sensitivity of the target scanner with reference to a set of tunable parameters. A differential model represents deviations of the target scanner from the reference. The targe...

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Bibliographic Details
Main Authors KOONMEN JAMES PATRICK, GOOSSENS RONALDUS JOHANNES,GLJSBERTUS, SHAO WENJIN, YE JUN, CAO YU
Format Patent
LanguageEnglish
Published 14.01.2010
Subjects
CALCULATING
COMPUTING
COUNTING
ELECTRIC DIGITAL DATA PROCESSING
PHYSICS
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Summary:Systems and methods for tuning photolithographic processes are described. A model of a target scanner is maintained defining sensitivity of the target scanner with reference to a set of tunable parameters. A differential model represents deviations of the target scanner from the reference. The target scanner may be tuned based on the settings of the reference scanner and the differential model. Performance of a family of related scanners may be characterized relative to the performance of a reference scanner. Differential models may include information such as parametric offsets and other differences that may be used to simulate the difference in imaging behavior.
Bibliography:Application Number: US20090475080