REMOVAL METHOD OF SURFACE DAMAGE OF SINGLE CRYSTAL DIAMOND

The present invention provides a process for removing surface damage of a single-crystal diamond, which comprises implanting ions into a single-crystal diamond to form a non-diamond layer near a surface of the diamond, graphitizing the non-diamond layer, and removing a surface layer by etching. Acco...

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Bibliographic Details
Main Authors YAMADA HIDEAKI, CHAYAHARA AKIYOSHI, MOKUNO YOSHIAKI
Format Patent
LanguageEnglish
Published 07.01.2010
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Summary:The present invention provides a process for removing surface damage of a single-crystal diamond, which comprises implanting ions into a single-crystal diamond to form a non-diamond layer near a surface of the diamond, graphitizing the non-diamond layer, and removing a surface layer by etching. According to the invention, the surface damage can be removed or reduced without increasing the surface roughness of a single crystal diamond.
Bibliography:Application Number: US20080336841