REMOVAL METHOD OF SURFACE DAMAGE OF SINGLE CRYSTAL DIAMOND
The present invention provides a process for removing surface damage of a single-crystal diamond, which comprises implanting ions into a single-crystal diamond to form a non-diamond layer near a surface of the diamond, graphitizing the non-diamond layer, and removing a surface layer by etching. Acco...
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Main Authors | , , |
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Format | Patent |
Language | English |
Published |
07.01.2010
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Subjects | |
Online Access | Get full text |
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Summary: | The present invention provides a process for removing surface damage of a single-crystal diamond, which comprises implanting ions into a single-crystal diamond to form a non-diamond layer near a surface of the diamond, graphitizing the non-diamond layer, and removing a surface layer by etching. According to the invention, the surface damage can be removed or reduced without increasing the surface roughness of a single crystal diamond. |
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Bibliography: | Application Number: US20080336841 |