OPTICAL DEVICE AND EXPOSURE APPARATUS

The present invention provides an optical device and an exposure apparatus capable of suppressing a reduction in light output. The optical device of the present invention includes a laser light source which emits laser light having a short wavelength (e.g., 160 to 500 nm), a lens, a transparent memb...

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Bibliographic Details
Main Authors MUKAI ATSUSHI, SONODA SHINICHIRO
Format Patent
LanguageEnglish
Published 31.12.2009
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:The present invention provides an optical device and an exposure apparatus capable of suppressing a reduction in light output. The optical device of the present invention includes a laser light source which emits laser light having a short wavelength (e.g., 160 to 500 nm), a lens, a transparent member and an optical fiber provided with a junction-inhibiting film. The optical device is configured such that light density of abutment faces between the transparent member and the optical fiber formed with the junction-inhibiting film is 4464 W/mm2 or less, thereby suppressing a reduction in light output which may be caused by fusion.
Bibliography:Application Number: US20080112474