METHOD OF PATTERNING A LAYER USING A PELLICLE
A method for patterning a layer on a semiconductor substrate includes forming a layer of a semiconductor substrate and exposing the layer to light. The light travels through a second pellicle that is manufactured by a method that includes determining a first transmission of a first light through a f...
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Main Authors | , , |
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Format | Patent |
Language | English |
Published |
21.05.2009
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Subjects | |
Online Access | Get full text |
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Summary: | A method for patterning a layer on a semiconductor substrate includes forming a layer of a semiconductor substrate and exposing the layer to light. The light travels through a second pellicle that is manufactured by a method that includes determining a first transmission of a first light through a first pellicle, wherein the first light is normal to the first pellicle, determining a second transmission of a second light through the first pellicle, wherein the second light is not normal to the first pellicle, and modifying the first pellicle to form a second pellicle using the first and second transmission. |
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Bibliography: | Application Number: US20060279672 |