Solution for immersion exposure and immersion exposure method

• Main Authors: NAKAYAMA NORIO, KAGAYAMA AKIFUMI, TAMATANI HIROAKI
• Format: Patent
• Language: English
• Published: 21.05.2009
• Subjects: ADHESIVES; APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMISTRY; CINEMATOGRAPHY; DYES; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE; MATERIALS THEREFOR; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; ORIGINALS THEREFOR; PAINTS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; POLISHES

The object is to resolve a finer pattern with a narrower line/space width by immersion lithography technology in the manufacture of a semiconductor or the like. A liquid for use in immersion exposure includes a saturated hydrocarbon compound as a main component, wherein the content of an impurity or...