DESIGN STRUCTURE FOR PARTITIONED DUMMY FILL SHAPES FOR REDUCED MASK BIAS WITH ALTERNATING PHASE SHIFT MASKS

A design structure, method, and system for partitioned dummy fill shapes for reduced mask bias with alternating phase shift masks, or with other two-mask lithographic processes employing a trim mask. A design structure is embodied in a machine readable medium used in a design process, the design str...

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Bibliographic Details
Main Authors SUCHARITAVES JEANNE-TANIA, LANDIS HOWARD S, FAURE THOMAS B
Format Patent
LanguageEnglish
Published 16.04.2009
Subjects
CALCULATING
COMPUTING
COUNTING
ELECTRIC DIGITAL DATA PROCESSING
PHYSICS
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Summary:A design structure, method, and system for partitioned dummy fill shapes for reduced mask bias with alternating phase shift masks, or with other two-mask lithographic processes employing a trim mask. A design structure is embodied in a machine readable medium used in a design process, the design structure comprising regions in a finished semiconductor design that do not contain as-designed shapes. The design structure additionally includes dummy fill shapes in the regions at a predetermined final density, wherein the generated dummy shapes are sized so that their local density is increased to a predetermined value. Moreover, corresponding trim shapes act to expose an oversized portion of the dummy shape, effectively trimming each dummy shape back to the predetermined final density.
Bibliography:Application Number: US20070872924