Method and apparatus for chemical mixing in a single wafer process

A method of and apparatus for mixing chemicals in a single wafer process. According to the present invention a chemical is fed into a valve system having a tube of a known volume. The chemical is fed into the valve system to fill the tube with a chemical to generate a measured amount of the chemical...

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Bibliographic Details
Main Authors ENDO RICK R, KO ALEXANDER, VERHAVERBEKE STEVEN, TRUMAN J. KELLY
Format Patent
LanguageEnglish
Published 29.01.2009
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Summary:A method of and apparatus for mixing chemicals in a single wafer process. According to the present invention a chemical is fed into a valve system having a tube of a known volume. The chemical is fed into the valve system to fill the tube with a chemical to generate a measured amount of the chemical. The measured amount of chemical is then used in a single wafer process.
Bibliography:Application Number: US20080284128