Method and apparatus for chemical mixing in a single wafer process
A method of and apparatus for mixing chemicals in a single wafer process. According to the present invention a chemical is fed into a valve system having a tube of a known volume. The chemical is fed into the valve system to fill the tube with a chemical to generate a measured amount of the chemical...
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Main Authors | , , , |
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Format | Patent |
Language | English |
Published |
29.01.2009
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Subjects | |
Online Access | Get full text |
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Summary: | A method of and apparatus for mixing chemicals in a single wafer process. According to the present invention a chemical is fed into a valve system having a tube of a known volume. The chemical is fed into the valve system to fill the tube with a chemical to generate a measured amount of the chemical. The measured amount of chemical is then used in a single wafer process. |
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Bibliography: | Application Number: US20080284128 |