METHOD AND APPARATUS FOR CLEANING A SUBSTRATE
An apparatus for wet processing individual substrates comprising; a means for holding the substrate; a means for providing acoustic energy to a non-device side of the substrate; and a means for flowing a fluid onto a device side of the substrate.
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Main Authors | , , , |
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Format | Patent |
Language | English |
Published |
22.01.2009
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Subjects | |
Online Access | Get full text |
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Summary: | An apparatus for wet processing individual substrates comprising; a means for holding the substrate; a means for providing acoustic energy to a non-device side of the substrate; and a means for flowing a fluid onto a device side of the substrate. |
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Bibliography: | Application Number: US20080233504 |