SEMICONDUCTOR DEVICE INCLUDING CONDUCTIVE LINES WITH FINE LINE WIDTH AND METHOD OF FABRICATING THE SAME

A semiconductor device comprises a semiconductor substrate including a first core region and a second core region between which a cell array region is interposed, a first conductive line and a second conductive line extending to the first core region across the cell array region, and a third conduct...

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Bibliographic Details
Main Authors SEO HYEOUNG-WON, ROH BYUNG-HYUG, JEON SANG-MIN, KIM SEONG-GOO
Format Patent
LanguageEnglish
Published 28.08.2008
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:A semiconductor device comprises a semiconductor substrate including a first core region and a second core region between which a cell array region is interposed, a first conductive line and a second conductive line extending to the first core region across the cell array region, and a third conductive line and a fourth conductive line extending to the second core region across the cell array region, wherein a line width of the first through fourth conductive lines is smaller than a resolution limit in a lithography process.
Bibliography:Application Number: US20070865738