METHOD OF CLEANING SEMICONDUCTOR DEVICE
A method of cleaning a semiconductor device. The method includes: A chemical cleaning using an organic solvent without using deionized water. An iso propyl alcohol cleaning using the iso propyl alcohol. Drying by inserting the semiconductor device into a dryer and then ejecting an inert gas thereto...
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Main Author | |
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Format | Patent |
Language | English |
Published |
26.06.2008
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Subjects | |
Online Access | Get full text |
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Summary: | A method of cleaning a semiconductor device. The method includes: A chemical cleaning using an organic solvent without using deionized water. An iso propyl alcohol cleaning using the iso propyl alcohol. Drying by inserting the semiconductor device into a dryer and then ejecting an inert gas thereto to dry and clean simultaneously. A method may clean a semiconductor device without using deionized water, so that corrosion of the semiconductor device can be substantially prevented by avoiding the use of deionized water, while substantially removing containments from the semiconductor device. |
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Bibliography: | Application Number: US20070959281 |