AVALANCHE PHOTODIODE
A photodiode designed to capture incident photons includes a stack of at least three superposed layers of semiconductor materials having a first conductivity type The stack includes: an interaction layer designed to interact with incident photons so as to generate photocarriers, a collection layer t...
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Main Author | |
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Format | Patent |
Language | English |
Published |
20.03.2008
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Subjects | |
Online Access | Get full text |
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Summary: | A photodiode designed to capture incident photons includes a stack of at least three superposed layers of semiconductor materials having a first conductivity type The stack includes: an interaction layer designed to interact with incident photons so as to generate photocarriers, a collection layer to collect the photocarriers; a confinement layer designed to confine the photocarriers in the collection layer. The collection layer has a band gap less than the band gaps of the interaction layer and confinement layer. The photodiode also includes a region which extends transversely relative to the planes of the layers. The region is in contact with the collection layer and confinement layer and has a conductivity type opposite to the first conductivity type so as to form a p-n junction with the stack. |
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Bibliography: | Application Number: US20070853871 |