SEMICONDUCTOR WAFER FRONT SIDE PROTECTION
There is provided a method for making a wafer comprising the steps of providing a substrate having a first surface, an opposite second surface, and at least one side edge defining a thickness of the substrate, the at least one side edge having a first peripheral region and a second peripheral region...
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Main Authors | , , , , , , |
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Format | Patent |
Language | English |
Published |
13.03.2008
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Subjects | |
Online Access | Get full text |
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