SEMICONDUCTOR WAFER FRONT SIDE PROTECTION

There is provided a method for making a wafer comprising the steps of providing a substrate having a first surface, an opposite second surface, and at least one side edge defining a thickness of the substrate, the at least one side edge having a first peripheral region and a second peripheral region...

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Bibliographic Details
Main Authors KRYWANCZYK TIMOTHY C, ABRAMS ALLAN D, BROUILLETTE DONALD W, DANAHER JOSEPH D, STONE IVAN J, WHALEN MATTHEW R, LAMOTHE RENE A
Format Patent
LanguageEnglish
Published 13.03.2008
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