PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY
A projection objective for microlithography for imaging a pattern arranged in the object plane of the projection objective into the image plane of the projection objective has at least one polarization splitter device that is operated only once in transmission or reflection. By using this device, po...
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Main Authors | , , |
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Format | Patent |
Language | English |
Published |
28.02.2008
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Subjects | |
Online Access | Get full text |
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Summary: | A projection objective for microlithography for imaging a pattern arranged in the object plane of the projection objective into the image plane of the projection objective has at least one polarization splitter device that is operated only once in transmission or reflection. By using this device, polarization-dependent differences in the intensity and response of the light passing through the objective, which lead to a worsening of the imaging quality of the projection objective, can largely be avoided. |
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Bibliography: | Application Number: US20070849817 |