Single-poly EEPROM cell and method for formign the same
A method for forming a depletion-mode single-poly electrically erasable programmable read-only memory (EEPROM) cell is provided. The method comprises providing a substrate having a floating region and a control region. Then, an isolation deep well and a deep well are formed in the floating region an...
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Main Authors | , |
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Format | Patent |
Language | English |
Published |
10.01.2008
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Subjects | |
Online Access | Get full text |
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Summary: | A method for forming a depletion-mode single-poly electrically erasable programmable read-only memory (EEPROM) cell is provided. The method comprises providing a substrate having a floating region and a control region. Then, an isolation deep well and a deep well are formed in the floating region and the control region of the substrate respectively. A well region is formed in the isolation deep well simultaneously with forming an isolation well region between the isolation deep well and the deep well in the substrate. A depletion doped region and a cell implant region are formed at the well region of the substrate and the deep well of the substrate respectively. A floating gate structure is formed across over the floating region and the control region. An implantation process is performed to form a source/drain region and a heavily doped region in the depletion doped region and the cell implant region respectively. |
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Bibliography: | Application Number: US20060484225 |