Single-poly EEPROM cell and method for formign the same

A method for forming a depletion-mode single-poly electrically erasable programmable read-only memory (EEPROM) cell is provided. The method comprises providing a substrate having a floating region and a control region. Then, an isolation deep well and a deep well are formed in the floating region an...

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Bibliographic Details
Main Authors TUNG MING-TSUNG, CHEN JUNGING
Format Patent
LanguageEnglish
Published 10.01.2008
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Summary:A method for forming a depletion-mode single-poly electrically erasable programmable read-only memory (EEPROM) cell is provided. The method comprises providing a substrate having a floating region and a control region. Then, an isolation deep well and a deep well are formed in the floating region and the control region of the substrate respectively. A well region is formed in the isolation deep well simultaneously with forming an isolation well region between the isolation deep well and the deep well in the substrate. A depletion doped region and a cell implant region are formed at the well region of the substrate and the deep well of the substrate respectively. A floating gate structure is formed across over the floating region and the control region. An implantation process is performed to form a source/drain region and a heavily doped region in the depletion doped region and the cell implant region respectively.
Bibliography:Application Number: US20060484225