Dental materials based on radically polymerizable macromers with antimicrobial effect

Dental material which contains at least one compound of the formula [PG]m-R1-Z-SP-Y-R2-[WG]p, in which m=1, 2 or 3; p=1, 2 or 3; R1=is absent, a linear or branched C1 to C20 alkylene radical which can be interrupted one or more times by O, S, NH, SiR', CONH CONR', COO and/or OCONH, a subst...

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Main Authors RHEINBERGER VOLKER, POPPE DIRK, TILLER JORG, SALZ ULRICH, ZIMMERMANN JORG, WASCHINSKI CHRISTIAN
Format Patent
LanguageEnglish
Published 01.11.2007
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Summary:Dental material which contains at least one compound of the formula [PG]m-R1-Z-SP-Y-R2-[WG]p, in which m=1, 2 or 3; p=1, 2 or 3; R1=is absent, a linear or branched C1 to C20 alkylene radical which can be interrupted one or more times by O, S, NH, SiR', CONH CONR', COO and/or OCONH, a substituted or unsubstituted, aromatic C6 to C14 radical or a combination thereof; R2=is absent, a linear or branched C1 to C20 alkylene radical which can be interrupted one or more times by O, S, NH, SiR', CONH CONR', COO and/or OCONH, a substituted or unsubstituted, aromatic C6 to C14 radical or a combination thereof; PG=a radically polymerizable group; SP=a polymeric spacer which is selected from polyethylene glycol, polypropylene glycol, polyglycerol, polyalkyloxazoline, polyethyleneimine, polyacrylic acid, polymethacrylic acid, polyvinyl alcohol, polyvinyl acetate, poly-(2-hydroxyethyl)acrylate, poly-(2-hydroxyethyl)methacrylate groups, hydrophilic polypeptide groups and copolymers of the corresponding monomers; WG=antimicrobially active group; Z=is absent, O, S, an ester, amide or urethane group; Y=is absent, O, S, an ester, amide or urethane group, and which has a molecular weight of at least 1.000.
Bibliography:Application Number: US20060502420