Process control systems and methods

Process control systems and methods for semiconductor device manufacturing are disclosed. A plurality of feedback and feed-forward loops are used to accurately control the critical dimension (CD) of features formed on material layers of semiconductor devices. Semiconductor devices with features havi...

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Main Authors ZHUANG HAOREN, LIPINSKI MATTHIAS, GUTMANN ALOIS, LIAN JINGYU, SARMA CHANDRASEKHAR
Format Patent
LanguageEnglish
Published 11.10.2007
Subjects
CALCULATING
COMPUTING
COUNTING
ELECTRIC DIGITAL DATA PROCESSING
PHYSICS
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Abstract Process control systems and methods for semiconductor device manufacturing are disclosed. A plurality of feedback and feed-forward loops are used to accurately control the critical dimension (CD) of features formed on material layers of semiconductor devices. Semiconductor devices with features having substantially the same dimension for each die across the surface of a wafer may be fabricated using the novel process control systems and methods described herein.
AbstractList Process control systems and methods for semiconductor device manufacturing are disclosed. A plurality of feedback and feed-forward loops are used to accurately control the critical dimension (CD) of features formed on material layers of semiconductor devices. Semiconductor devices with features having substantially the same dimension for each die across the surface of a wafer may be fabricated using the novel process control systems and methods described herein.
Author GUTMANN ALOIS
LIAN JINGYU
ZHUANG HAOREN
LIPINSKI MATTHIAS
SARMA CHANDRASEKHAR
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Snippet Process control systems and methods for semiconductor device manufacturing are disclosed. A plurality of feedback and feed-forward loops are used to accurately...
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COMPUTING
COUNTING
ELECTRIC DIGITAL DATA PROCESSING
PHYSICS
Title Process control systems and methods
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