Process control systems and methods
Process control systems and methods for semiconductor device manufacturing are disclosed. A plurality of feedback and feed-forward loops are used to accurately control the critical dimension (CD) of features formed on material layers of semiconductor devices. Semiconductor devices with features havi...
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Main Authors | , , , , |
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Format | Patent |
Language | English |
Published |
11.10.2007
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Subjects | |
Online Access | Get full text |
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Summary: | Process control systems and methods for semiconductor device manufacturing are disclosed. A plurality of feedback and feed-forward loops are used to accurately control the critical dimension (CD) of features formed on material layers of semiconductor devices. Semiconductor devices with features having substantially the same dimension for each die across the surface of a wafer may be fabricated using the novel process control systems and methods described herein. |
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Bibliography: | Application Number: US20060390696 |