Transmission line element and method of frabricating the same
A microstrip line element is composed of a first electrode layer ( 10 ) as a substrate which is more of a metal, a dielectric layer ( 20 ) formed by oxidizing, nitriding or oxynitriding the first electrode layer ( 10 ), a conductor layer ( 30 ) formed on the dielectric layer ( 20 ) and a second elec...
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Main Authors | , , , , |
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Format | Patent |
Language | English |
Published |
16.08.2007
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Subjects | |
Online Access | Get full text |
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Summary: | A microstrip line element is composed of a first electrode layer ( 10 ) as a substrate which is more of a metal, a dielectric layer ( 20 ) formed by oxidizing, nitriding or oxynitriding the first electrode layer ( 10 ), a conductor layer ( 30 ) formed on the dielectric layer ( 20 ) and a second electrode layer ( 40 ) formed on the conductor layer ( 30 ). The conductor layer ( 30 ) is composed of at least conductive nanoparticles ( 32 ) and a binder resin ( 31 ). |
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Bibliography: | Application Number: US20050592008 |