Transmission line element and method of frabricating the same

A microstrip line element is composed of a first electrode layer ( 10 ) as a substrate which is more of a metal, a dielectric layer ( 20 ) formed by oxidizing, nitriding or oxynitriding the first electrode layer ( 10 ), a conductor layer ( 30 ) formed on the dielectric layer ( 20 ) and a second elec...

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Bibliographic Details
Main Authors WAKABAYASHI YOSHIAKI, HIGUCHI AKIJI, TOHYA HIROKAZU, YAMAGUCHI KOUICHI, YAMADA KENJI
Format Patent
LanguageEnglish
Published 16.08.2007
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Summary:A microstrip line element is composed of a first electrode layer ( 10 ) as a substrate which is more of a metal, a dielectric layer ( 20 ) formed by oxidizing, nitriding or oxynitriding the first electrode layer ( 10 ), a conductor layer ( 30 ) formed on the dielectric layer ( 20 ) and a second electrode layer ( 40 ) formed on the conductor layer ( 30 ). The conductor layer ( 30 ) is composed of at least conductive nanoparticles ( 32 ) and a binder resin ( 31 ).
Bibliography:Application Number: US20050592008