Plasma generating devices having alternative ground geometry and methods for using the same

Aspects of the invention include plasma generating devices having alternative ground geometries and systems thereof, as well as methods of using the same in plasma generation. The plasma generating devices of the invention include a resonator with a discharge gap disposed on a substrate and a ground...

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Bibliographic Details
Main Authors TABER ROBERT C, DUTTON DAVID T
Format Patent
LanguageEnglish
Published 26.07.2007
Subjects
BASIC ELECTRONIC CIRCUITRY
ELECTRICITY
GENERATION OF NOISE BY SUCH CIRCUITS
GENERATION OF OSCILLATIONS, DIRECTLY OR BY FREQUENCY-CHANGING,BY CIRCUITS EMPLOYING ACTIVE ELEMENTS WHICH OPERATE IN ANON-SWITCHING MANNER
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Summary:Aspects of the invention include plasma generating devices having alternative ground geometries and systems thereof, as well as methods of using the same in plasma generation. The plasma generating devices of the invention include a resonator with a discharge gap disposed on a substrate and a ground element. Embodiments of the ground element of the plasma generating devices of the invention include those that are internal, external, coplanar or a combination thereof. The subject plasma generating devices, systems and methods find use in a variety of different applications.
Bibliography:Application Number: US20060485051