Photoresist composition for deep ultraviolet lithography
The present invention relates to a photoresist composition comprising a photoacid generator and at least one polymer comprising at least one unit as described by structure 1, The invention also relates to a process for imaging the photoresist composition of the present invention, and to a process of...
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Main Authors | , , |
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Format | Patent |
Language | English |
Published |
05.07.2007
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Subjects | |
Online Access | Get full text |
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Summary: | The present invention relates to a photoresist composition comprising a photoacid generator and at least one polymer comprising at least one unit as described by structure 1, The invention also relates to a process for imaging the photoresist composition of the present invention, and to a process of making the polymer in the presence of an organic base. |
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Bibliography: | Application Number: US20070716361 |