Photoprotector and/or photoimmunoprotector compositions of the skin and their uses

The composition comprises of a component A selected from a hydroxylated derivative of benzoic acid or of cinamic acid, their esters, amides or salts, a glycoside of a hexose, and their mixtures; and a component B selected from quinic acid, shikimic acid, their alkaline metal or alkaline earth salts,...

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Main Authors PATHAK MADHUKAR A, GARCIA MARTINEZ FERNANDO, ALONSO LEBRERO JOSE L, GUERRERO GOMEZ-PAMO ANTONIO, PIVEL RAVIERY JUAN P, DOMINGUEZ VALDES-HEVIA MARTA, BRIEVA DELGADO AURORA M, GONZALEZ RODRIGUEZ SALVADOR
Format Patent
LanguageEnglish
Published 01.02.2007
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Summary:The composition comprises of a component A selected from a hydroxylated derivative of benzoic acid or of cinamic acid, their esters, amides or salts, a glycoside of a hexose, and their mixtures; and a component B selected from quinic acid, shikimic acid, their alkaline metal or alkaline earth salts, their methyl esters, and mixtures of the same. This composition is suitable for protecting the skin against ultraviolet radiation coming from the sun or artificial sources, such as those used in phototherapy units and in sun tanning rooms. For application in the field of dermatology and nutrition, and, in particular, in the photoprotection of the skin and mucosa, photo-ageing and photocarcinogenesis, including protection of the immune system associated with the skin.
Bibliography:Application Number: US20060541350