Processes for testing a region for an analyte and a process for forming an electronic device

A workpiece, including a substrate and overlying layer, can be exposed to a region, such as a process chamber, to test for the presence of an analyte. Detected fluorescence emission signals during TXRD due to the substrate are significantly reduced, allowing the analyte to be detected at lower conce...

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Bibliographic Details
Main Authors HUES STEVEN M, FAKHREDDINE HASSAN F, SIELOFF DAVID D, LOVEJOY MICHAEL L
Format Patent
LanguageEnglish
Published 24.08.2006
Subjects
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASURING
PHYSICS
TESTING
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Summary:A workpiece, including a substrate and overlying layer, can be exposed to a region, such as a process chamber, to test for the presence of an analyte. Detected fluorescence emission signals during TXRD due to the substrate are significantly reduced, allowing the analyte to be detected at lower concentrations. In one embodiment, the substrate can principally include silicon, and the layer can include an organic layer (e.g., resist, polyimide, etc.) The organic layer allows analytes with an atomic number as low as 11 to be detected. Also, the detection limits for nearly all analytes can be reduced because the detector is not receiving a disproportionately larger number of fluorescence emission from silicon. In additional, areal information regarding the analyte with respect to position over the substrate can be obtained. Detection levels as low as 1E9 atoms/cm2 are possible.
Bibliography:Application Number: US20050060833