Composition for cleaning and degreasing, system for using the composition, and methods of forming and using the composition
A composition for cleaning and degreasing substrates, methods of forming and using the composition, and a system and method for recycling the composition are provided. The composition includes a 2-ethylhexyl ester and may also include co-solvents, diluents, surfactants, and adjutants.
Saved in:
Main Author | |
---|---|
Format | Patent |
Language | English |
Published |
13.04.2006
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Summary: | A composition for cleaning and degreasing substrates, methods of forming and using the composition, and a system and method for recycling the composition are provided. The composition includes a 2-ethylhexyl ester and may also include co-solvents, diluents, surfactants, and adjutants. |
---|---|
Bibliography: | Application Number: US20050248782 |