Composition for cleaning and degreasing, system for using the composition, and methods of forming and using the composition

A composition for cleaning and degreasing substrates, methods of forming and using the composition, and a system and method for recycling the composition are provided. The composition includes a 2-ethylhexyl ester and may also include co-solvents, diluents, surfactants, and adjutants.

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Bibliographic Details
Main Author ZAKI NAEL N
Format Patent
LanguageEnglish
Published 13.04.2006
Subjects
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Summary:A composition for cleaning and degreasing substrates, methods of forming and using the composition, and a system and method for recycling the composition are provided. The composition includes a 2-ethylhexyl ester and may also include co-solvents, diluents, surfactants, and adjutants.
Bibliography:Application Number: US20050248782