Ultrathin polymeric photoacid generator layer and method of fabricating at least one of a device and a mask by using said layer

A barrier layer for fabricating at least one of a device and a mask includes a polymeric photoacid generator formed between a substrate and a resist layer. The barrier layer may be used, for example, in forming a resist image, and forming a patterned material feature on a substrate.

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Bibliographic Details
Main Authors LI WENJIE, HUANG WU-SONG, MEDEIROS DAVID R, PETRILLO KAREN E, BREYTA GREGORY, LANG ROBERT N, MOREAU WAYNE M, ANGELOPOULOS MARIE
Format Patent
LanguageEnglish
Published 16.02.2006
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:A barrier layer for fabricating at least one of a device and a mask includes a polymeric photoacid generator formed between a substrate and a resist layer. The barrier layer may be used, for example, in forming a resist image, and forming a patterned material feature on a substrate.
Bibliography:Application Number: US20040916755