Substrate profile analysis

A system for analyzing fabrication processes, such as analyzing device yield on a substrate. An input accesses fabrication information, where the fabrication information includes at least one of an dependent variable that is associated with substrate location information, and at least one independen...

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Bibliographic Details
Main Authors WHITEFIELD BRUCE J, ABERCROMBIE DAVID A
Format Patent
LanguageEnglish
Published 29.12.2005
Edition7
Subjects
CALCULATING
CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION ORPROCESSING OF GOODS
COMPUTING
CONTROL OR REGULATING SYSTEMS IN GENERAL
CONTROLLING
COUNTING
ELECTRIC DIGITAL DATA PROCESSING
FUNCTIONAL ELEMENTS OF SUCH SYSTEMS
GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS
MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS
PHYSICS
REGULATING
TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINSTCLIMATE CHANGE
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Summary:A system for analyzing fabrication processes, such as analyzing device yield on a substrate. An input accesses fabrication information, where the fabrication information includes at least one of an dependent variable that is associated with substrate location information, and at least one independent variable that is associated with at least one of the fabrication processes. Desired portions of the substrate information are selected, based on at least one of the independent variable and the dependent variable. A substrate profile is produced, based on the desired portions of the fabrication information.
Bibliography:Application Number: US20040867003