Variable seal pressure slit valve doors for semiconductor manufacturing equipment
Techniques for a door system for sealing an opening between two chambers in a semiconductor processing system are described. A sealing member seals the opening when a door is in a closed position. To selectively open and close the opening, an actuator moves the door. A valve actuator switch provides...
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Main Authors | , , |
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Format | Patent |
Language | English |
Published |
08.12.2005
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Edition | 7 |
Subjects | |
Online Access | Get full text |
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Summary: | Techniques for a door system for sealing an opening between two chambers in a semiconductor processing system are described. A sealing member seals the opening when a door is in a closed position. To selectively open and close the opening, an actuator moves the door. A valve actuator switch provides a first or second pressure to the actuator depending on the pressure inside a first chamber. In one embodiment, a sensor monitors the pressure inside the first chamber. |
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Bibliography: | Application Number: US20040990125 |