Variable seal pressure slit valve doors for semiconductor manufacturing equipment

Techniques for a door system for sealing an opening between two chambers in a semiconductor processing system are described. A sealing member seals the opening when a door is in a closed position. To selectively open and close the opening, an actuator moves the door. A valve actuator switch provides...

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Bibliographic Details
Main Authors BANG WON B, WANG YEN-KUN V, TRAN TOAN Q
Format Patent
LanguageEnglish
Published 08.12.2005
Edition7
Subjects
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Summary:Techniques for a door system for sealing an opening between two chambers in a semiconductor processing system are described. A sealing member seals the opening when a door is in a closed position. To selectively open and close the opening, an actuator moves the door. A valve actuator switch provides a first or second pressure to the actuator depending on the pressure inside a first chamber. In one embodiment, a sensor monitors the pressure inside the first chamber.
Bibliography:Application Number: US20040990125