Antenna for plasma processor apparatus
An antenna includes excitation terminals responsive to an RF source to supply an RF electromagnetic field to a plasma that processes a workpiece in a vacuum chamber. The coil includes a transformer having a primary winding coupled to the excitation terminals and a multi-turn plasma excitation second...
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Main Authors | , |
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Format | Patent |
Language | English |
Published |
16.06.2005
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Edition | 7 |
Subjects | |
Online Access | Get full text |
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Summary: | An antenna includes excitation terminals responsive to an RF source to supply an RF electromagnetic field to a plasma that processes a workpiece in a vacuum chamber. The coil includes a transformer having a primary winding coupled to the excitation terminals and a multi-turn plasma excitation secondary winding connected in series with a capacitor. |
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Bibliography: | Application Number: US20050044269 |