Phase-shift mask and fabrication thereof
Disclosed are phase-shift photomask and method for its fabrication. The phase-shift features of the photomask are formed by using electron-curing sol-gel coatings. Ultra-fine phase-shift features can be created according to the method. The process disclosed is simpler than conventional method for pr...
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Main Authors | , |
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Format | Patent |
Language | English |
Published |
26.05.2005
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Edition | 7 |
Subjects | |
Online Access | Get full text |
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Summary: | Disclosed are phase-shift photomask and method for its fabrication. The phase-shift features of the photomask are formed by using electron-curing sol-gel coatings. Ultra-fine phase-shift features can be created according to the method. The process disclosed is simpler than conventional method for producing phase-shift photomasks. |
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Bibliography: | Application Number: US20040950051 |