Test structures for estimating dishing and erosion effects in copper damascene technology

A test structure combines a first structure (1010) for erosion evaluation with a second structure (1000) for extraction of defect size distributions. The first structure (1010) is a loop structure usable determine a resistance value that varies with metal height. The second structure is a NEST struc...

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Bibliographic Details
Main Authors STINE BRIAN E, HESS CHRISTOPHER, DECKER MARKUS, WEILAND LARG H, CIPLICKAS DENNIS J
Format Patent
LanguageEnglish
Published 25.11.2004
Edition7
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:A test structure combines a first structure (1010) for erosion evaluation with a second structure (1000) for extraction of defect size distributions. The first structure (1010) is a loop structure usable determine a resistance value that varies with metal height. The second structure is a NEST structure (1000). Loop lines of the loop structure (1010) are connected on both sides of the NEST structure (1000).
Bibliography:Application Number: US20040490908