Method of optimizing target quantities for optical precision measurement and apparatus therefor
A method for optimizing target quantities for optical precision measuring includes obtaining ancillary parameters from image data of a workpiece which is to be measured. Control data for influence quantities of the target quantities are derived from the ancillary parameters. The control data is deri...
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Main Authors | , , |
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Format | Patent |
Language | English |
Published |
08.07.2004
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Edition | 7 |
Subjects | |
Online Access | Get full text |
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Summary: | A method for optimizing target quantities for optical precision measuring includes obtaining ancillary parameters from image data of a workpiece which is to be measured. Control data for influence quantities of the target quantities are derived from the ancillary parameters. The control data is derived as follows: by determining the courses of the ancillary parameters depending on at least one influence quantity and the courses of the ancillary parameters are determined in such a way that the courses have a like extremum of the functional dependence from the influence quantities. An overall course of the ancillary parameters is determined and an extremum of the overall course of the ancillary parameters is determined. Corresponding values of the influence quantities are determined at the site of the determined extremum as control data for the influence quantity. |
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Bibliography: | Application Number: US20030687914 |