Semiconductor structure having a textured nitride-based layer

A semiconductor structure having a textured nitride-based layer. The textured nitride-based layer can be formed above one or more crystalline nitride layers and a substrate, and can be formed into any desired pattern. The semiconductor structure can be incorporated as part of, for example, a field e...

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Bibliographic Details
Main Authors GASKA REMIGIJUS, HU XUHONG, SHUR MICHAEL
Format Patent
LanguageEnglish
Published 15.04.2004
Edition7
Subjects
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Summary:A semiconductor structure having a textured nitride-based layer. The textured nitride-based layer can be formed above one or more crystalline nitride layers and a substrate, and can be formed into any desired pattern. The semiconductor structure can be incorporated as part of, for example, a field effect transistor, a light emitting diode, or a laser.
Bibliography:Application Number: US20030676963