Semiconductor structure having a textured nitride-based layer
A semiconductor structure having a textured nitride-based layer. The textured nitride-based layer can be formed above one or more crystalline nitride layers and a substrate, and can be formed into any desired pattern. The semiconductor structure can be incorporated as part of, for example, a field e...
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Main Authors | , , |
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Format | Patent |
Language | English |
Published |
15.04.2004
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Edition | 7 |
Subjects | |
Online Access | Get full text |
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Summary: | A semiconductor structure having a textured nitride-based layer. The textured nitride-based layer can be formed above one or more crystalline nitride layers and a substrate, and can be formed into any desired pattern. The semiconductor structure can be incorporated as part of, for example, a field effect transistor, a light emitting diode, or a laser. |
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Bibliography: | Application Number: US20030676963 |