Method of removing resist using functional water and device therefor

A resist removal method and device therefor are provided that are excellent from the point of view of washing costs and environmental preservation and that also offer extremely high removal performance, and this method of resist removal using functional water according to the present invention inclu...

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Bibliographic Details
Main Authors OTAKE KIYOSHI, HISHINUMA NOBUYUKI
Format Patent
LanguageEnglish
Published 20.11.2003
Edition7
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:A resist removal method and device therefor are provided that are excellent from the point of view of washing costs and environmental preservation and that also offer extremely high removal performance, and this method of resist removal using functional water according to the present invention includes the following steps: (1) a step of irradiating a substrate to which resist has been applied with vacuum ultraviolet light of wavelength 172±10 nm; (2) a step of substantially uniformly applying functional water to this resist surface; and (3) a step of irradiating ultraviolet light of wavelength 190 to 310 nm onto this functional water.
Bibliography:Application Number: US20030441061