ANTISTATIC POLYMER COMPOSITIONS

The present invention relates to an antistatic polymer composition and more specifically to a composition comprising a thermoplastic polymer (A) and a copolymer (B) comprising polyamide blocks and polyether blocks comprising essentially ethylene oxide units -(C2H4-O)-, the copolymer (B) having a mel...

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Bibliographic Details
Main Authors HILGERS HERMANN JOSEF, LINEMANN REINHARD, LACROIX CHRISTOPHE
Format Patent
LanguageEnglish
Published 24.07.2003
Edition7
Subjects
ADHESIVES
CHEMISTRY
COMPOSITIONS BASED THEREON
COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
DYES
MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE
METALLURGY
MISCELLANEOUS APPLICATIONS OF MATERIALS
MISCELLANEOUS COMPOSITIONS
NATURAL RESINS
ORGANIC MACROMOLECULAR COMPOUNDS
PAINTS
POLISHES
THEIR PREPARATION OR CHEMICAL WORKING-UP
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Summary:The present invention relates to an antistatic polymer composition and more specifically to a composition comprising a thermoplastic polymer (A) and a copolymer (B) comprising polyamide blocks and polyether blocks comprising essentially ethylene oxide units -(C2H4-O)-, the copolymer (B) having a melting temperature of between 80 and 150° C. It is of use for the polymers (A) which are heat-sensitive or which are processed at low temperature.
Bibliography:Application Number: US20000556977