Method for fabricating high aspect ratio electrodes

In a method for building high aspect ratio electrodes in an electrode means (E) comprising parallel electrodes (epsi1,epsi2) in a dense arrangement, the electrodes are built in a repeatedly performed sequence of successive process steps involving the use of only one and the same photomask in every p...

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Bibliographic Details
Main Author GUDESEN HANS GUDE
Format Patent
LanguageEnglish
Published 17.07.2003
Edition7
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:In a method for building high aspect ratio electrodes in an electrode means (E) comprising parallel electrodes (epsi1,epsi2) in a dense arrangement, the electrodes are built in a repeatedly performed sequence of successive process steps involving the use of only one and the same photomask in every patterning step, the electrodes being formed with a desired aspect ratio according to the number of times the sequence is repeated, and top surface of the electrode means planarized in a final process step.
Bibliography:Application Number: US20020300801