Pattern formation material and pattern formation method

A pattern formation material of this invention contains a base polymer including a unit represented by Chemical Formula 1 and an acid generator: wherein R1 is a protecting group released by an acid.

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Bibliographic Details
Main Authors UEDA MITSURU, KISHIMURA SHINJI, SASAGO MASARU, ENDO MASAYUKI, FUJIGAYA TSUYOHIKO
Format Patent
LanguageEnglish
Published 15.05.2003
Edition7
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:A pattern formation material of this invention contains a base polymer including a unit represented by Chemical Formula 1 and an acid generator: wherein R1 is a protecting group released by an acid.
Bibliography:Application Number: US20020241758