Method of manufacturing member pattern and method of manufacturing wiring, circuit substrate, electron source, and image-forming apparatus

A method of manufacturing wiring includes a step of forming a conductive layer pattern through a developing step after performing film formation and exposure step using photosensitive paste that contains a photosensitive material and a conductive material, a step of forming an insulating layer patte...

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Bibliographic Details
Main Authors UDA YOSHIMI, ISHIWATA KAZUYA
Format Patent
LanguageEnglish
Published 06.02.2003
Edition7
Subjects
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Summary:A method of manufacturing wiring includes a step of forming a conductive layer pattern through a developing step after performing film formation and exposure step using photosensitive paste that contains a photosensitive material and a conductive material, a step of forming an insulating layer pattern through a developing step after performing film formation and exposure step using photosensitive paste that contains a photosensitive material and an insulating material, and a baking step for baking the conductive layer pattern and the insulating layer pattern. Thus, a wiring pattern can be formed with high precision by reducing an edge curl.
Bibliography:Application Number: US20020207864