Hole fill composition and method for filling holes in a substrate
A composition usable in hole filling of a metal layer and to planarize the metal layer is provided. The metal layer is part of a substrate which can be part of a multilayer printed circuit board or chip carrier. The composition comprises a fluoropolymer dielectric metal, a filler material, and a cou...
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Main Authors | , |
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Format | Patent |
Language | English |
Published |
12.12.2002
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Edition | 7 |
Subjects | |
Online Access | Get full text |
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Summary: | A composition usable in hole filling of a metal layer and to planarize the metal layer is provided. The metal layer is part of a substrate which can be part of a multilayer printed circuit board or chip carrier. The composition comprises a fluoropolymer dielectric metal, a filler material, and a coupling agent, the filler material having at least a partial coating of the coupling agent thereon. |
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Bibliography: | Application Number: US20010863961 |