Hole fill composition and method for filling holes in a substrate

A composition usable in hole filling of a metal layer and to planarize the metal layer is provided. The metal layer is part of a substrate which can be part of a multilayer printed circuit board or chip carrier. The composition comprises a fluoropolymer dielectric metal, a filler material, and a cou...

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Bibliographic Details
Main Authors FARQUHAR DONALD S, PAPATHOMAS KONSTANTINOS I
Format Patent
LanguageEnglish
Published 12.12.2002
Edition7
Subjects
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Summary:A composition usable in hole filling of a metal layer and to planarize the metal layer is provided. The metal layer is part of a substrate which can be part of a multilayer printed circuit board or chip carrier. The composition comprises a fluoropolymer dielectric metal, a filler material, and a coupling agent, the filler material having at least a partial coating of the coupling agent thereon.
Bibliography:Application Number: US20010863961