Application of vapor phase HFACAC-based compound for use in copper decontamination and cleaning processes
An effective copper decontamination method in the fabrication of integrated circuits is achieved. An organic-based HFACAC decontamination compound in vapor phase is sprayed over elemental copper found on equipment or tools or as a spill wherein the compound reacts with all of the elemental copper an...
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Main Authors | , , , , , , , |
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Format | Patent |
Language | English |
Published |
25.04.2002
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Edition | 7 |
Subjects | |
Online Access | Get full text |
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Summary: | An effective copper decontamination method in the fabrication of integrated circuits is achieved. An organic-based HFACAC decontamination compound in vapor phase is sprayed over elemental copper found on equipment or tools or as a spill wherein the compound reacts with all of the elemental copper and forms a volatile compound that can be flushed away thereby completing copper decontamination. |
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Bibliography: | Application Number: US20010882677 |