Pattern formation material and pattern formation method

A pattern formation material includes a base polymer. The base polymer includes a polymer of the acrylic family having a chlorine atom or a chlorinated alkyl group bonded to a carbon atom bonded to an ester site in the principal chain of an acrylic unit.

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Bibliographic Details
Main Authors KISHIMURA SHINJI, SASAGO MASARU
Format Patent
LanguageEnglish
Published 31.01.2002
Edition7
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CHEMISTRY
CINEMATOGRAPHY
COMPOSITIONS BASED THEREON
COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS
MATERIALS THEREFOR
METALLURGY
ORGANIC MACROMOLECULAR COMPOUNDS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
THEIR PREPARATION OR CHEMICAL WORKING-UP
USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS
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Summary:A pattern formation material includes a base polymer. The base polymer includes a polymer of the acrylic family having a chlorine atom or a chlorinated alkyl group bonded to a carbon atom bonded to an ester site in the principal chain of an acrylic unit.
Bibliography:Application Number: US20010837879