Pattern formation material and pattern formation method
A pattern formation material includes a base polymer. The base polymer includes a polymer of the acrylic family having a chlorine atom or a chlorinated alkyl group bonded to a carbon atom bonded to an ester site in the principal chain of an acrylic unit.
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Main Authors | , |
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Format | Patent |
Language | English |
Published |
31.01.2002
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Edition | 7 |
Subjects | |
Online Access | Get full text |
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Summary: | A pattern formation material includes a base polymer. The base polymer includes a polymer of the acrylic family having a chlorine atom or a chlorinated alkyl group bonded to a carbon atom bonded to an ester site in the principal chain of an acrylic unit. |
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Bibliography: | Application Number: US20010837879 |