Object positioning method for a lithographic projection apparatus

A method for placement of a object such as a substrate or a mask on a table, said method including: a first placement step in which the object is placed on a first position on the table; a measuring step in which a displacement between the first position of the object and the required position of th...

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Bibliographic Details
Main Authors ARIENS ANDREAS B.G, WILLEMS VAN DIJK MARCUS J.H, CASTENMILLER THOMAS J.M, VAN DE PASCH ENGELBERTUS A.F
Format Patent
LanguageEnglish
Published 16.08.2001
Edition7
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:A method for placement of a object such as a substrate or a mask on a table, said method including: a first placement step in which the object is placed on a first position on the table; a measuring step in which a displacement between the first position of the object and the required position of the object is determined; a removing step in which the object is released and removed from the table; a moving step in which the object and the table are moved relatively to each other by substantially the said displacement, in a direction substantially parallel to the surface of the table; and a second placement step in which the object is placed at the required position on the table.
Bibliography:Application Number: US20010777460