Method and system for reducing ARC layer removal bamd providing a capping layer for the ARC layer

A method and system for providing a semiconductor device is disclosed. The method and system include depositing an antireflective coating (ARC) layer having antireflective properties. The method and system also include depositing a capping layer on the ARC layer. The capping layer reduces a suscepti...

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Bibliographic Details
Main Author PLAT MARINA V
Format Patent
LanguageEnglish
Published 02.08.2001
Edition7
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:A method and system for providing a semiconductor device is disclosed. The method and system include depositing an antireflective coating (ARC) layer having antireflective properties. The method and system also include depositing a capping layer on the ARC layer. The capping layer reduces a susceptibility of the ARC layer to removal while allowing the ARC layer to substantially retain the antireflective properties.
Bibliography:Application Number: US20010825672