Abbe arm calibration system for use in lithographic apparatus

In a lithographic apparatus, a reference grating 11 mounted on the wafer table WT is illuminated with a measurement beam 20 incident in a direction independent of wafer table tilt. The diffraction orders are detected by detector 30 and used to determine the lateral shift in the wafer table resulting...

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Bibliographic Details
Main Authors STRAAIJER ALEXANDER, LOOPSTRA ERIK R, LEVASIER LEON M, GROENEVELD ROGIER H.M, BURGHOOM JACOBUS
Format Patent
LanguageEnglish
Published 19.07.2001
Edition7
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
ARMOUR
ARMOURED OR ARMED VEHICLES
ARMOURED TURRETS
BASIC ELECTRIC ELEMENTS
BLASTING
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HEATING
HOLOGRAPHY
LIGHTING
MATERIALS THEREFOR
MEANS OF ATTACK OR DEFENCE, e.g. CAMOUFLAGE, IN GENERAL
MEASURING
MEASURING ANGLES
MEASURING AREAS
MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS
MECHANICAL ENGINEERING
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
TESTING
WEAPONS
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Summary:In a lithographic apparatus, a reference grating 11 mounted on the wafer table WT is illuminated with a measurement beam 20 incident in a direction independent of wafer table tilt. The diffraction orders are detected by detector 30 and used to determine the lateral shift in the wafer table resulting from a non-zero Abbe arm, and hence the Abbe arm, for calibration purposes. The detector 30 may be a detector also used for off-axis alignment of the wafer and wafer table.
Bibliography:Application Number: US20010758172