Substrate treatment method and substrate treatment apparatus

A substrate treatment method includes an auto-recovery operation of automatically recovering a substrate when a treatment process of treating the substrate is interrupted due to an occurrence of an abnormality and a chamber neutralization operation of neutralizing an inside of a process chamber incl...

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Bibliographic Details
Main Authors Jeong, Ho Jin, Park, Sung Bum, Lim, Dong Ho, Song, Si Nae
Format Patent
LanguageEnglish
Published 15.10.2024
Subjects
BASIC ELECTRIC ELEMENTS
CLEANING
CLEANING IN GENERAL
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
PERFORMING OPERATIONS
PREVENTION OF FOULING IN GENERAL
SEMICONDUCTOR DEVICES
TRANSPORTING
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Summary:A substrate treatment method includes an auto-recovery operation of automatically recovering a substrate when a treatment process of treating the substrate is interrupted due to an occurrence of an abnormality and a chamber neutralization operation of neutralizing an inside of a process chamber including the substrate before the auto-recovery operation after the treatment process is stopped.
Bibliography:Application Number: US202318119870