Transparent and antistatic PMMA composition

A transparent antistatic composition based on polymethyl methacrylate (PMMA), including: 55% to 99.9% by weight of PMMA, and 0.1% to 45% by weight of at least one polyamide (PA) block-containing and polyether (PE) block-containing copolymer (PEBA) including polyethylene glycol (PEG), with respect to...

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Bibliographic Details
Main Authors Rauline, Damien, Loyen, Karine, Berdin, Laure, Malet, Frederic
Format Patent
LanguageEnglish
Published 27.08.2024
Subjects
ADHESIVES
CHEMISTRY
COMPOSITIONS BASED THEREON
COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
DYES
MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE
METALLURGY
MISCELLANEOUS APPLICATIONS OF MATERIALS
MISCELLANEOUS COMPOSITIONS
NATURAL RESINS
ORGANIC MACROMOLECULAR COMPOUNDS
PAINTS
POLISHES
THEIR PREPARATION OR CHEMICAL WORKING-UP
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Summary:A transparent antistatic composition based on polymethyl methacrylate (PMMA), including: 55% to 99.9% by weight of PMMA, and 0.1% to 45% by weight of at least one polyamide (PA) block-containing and polyether (PE) block-containing copolymer (PEBA) including polyethylene glycol (PEG), with respect to the total composition weight, said copolymer being characterized in that it includes in the range 50% to 80% by weight of PEG with respect to the total weight of copolymer.
Bibliography:Application Number: US201816113258