Three dimensional perpendicular magnetic tunnel junction with thin film transistor array
A method for manufacturing a magnetic random access memory array incudes forming a source region within a surface of a substrate, forming an array of three-dimensional (3D) structures over the substrate, each 3D structure being separated from an adjacent 3D structure by a cavity region, depositing a...
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Main Authors | , , , |
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Format | Patent |
Language | English |
Published |
20.08.2024
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Subjects | |
Online Access | Get full text |
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Summary: | A method for manufacturing a magnetic random access memory array incudes forming a source region within a surface of a substrate, forming an array of three-dimensional (3D) structures over the substrate, each 3D structure being separated from an adjacent 3D structure by a cavity region, depositing a channel material on a surface of at least one sidewall of each 3D structure, depositing a gate dielectric material over the channel material on the surface of the at least one sidewall of each 3D structure, forming a first isolation region in each cavity region between adjacent 3D structures over the substrate, and forming a first gate region over the first isolation region in each cavity region. |
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Bibliography: | Application Number: US202217811581 |