Line-end extension method and device

• Main Authors: Chang, Yu-Chen, Hsiao, Chih-Min, Chang, Shih-Ming, Yen, Yung-Sung, Liu, Ru-Gun, Lai, Chih-Ming, Lai, Chien-Wen
• Format: Patent
• Language: English
• Published: 13.08.2024
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

Methods of forming line-end extensions and devices having line-end extensions are provided. In some embodiments, a method includes forming a patterned photoresist on a first region of a hard mask layer. A line-end extension region is formed in the hard mask layer. The line-end extension region exten...