Semiconductor manufacturing apparatus and method for cleaning off deposit in chamber of same

The present application discloses a semiconductor manufacturing apparatus, including: a chamber including an inner chamber, an outer chamber and a passage communicating the inner chamber with the outer chamber, the passage being located between the inner chamber and a chamber sidewall; and one or mo...

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Bibliographic Details
Main Author Huang, Wulin
Format Patent
LanguageEnglish
Published 30.07.2024
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
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Summary:The present application discloses a semiconductor manufacturing apparatus, including: a chamber including an inner chamber, an outer chamber and a passage communicating the inner chamber with the outer chamber, the passage being located between the inner chamber and a chamber sidewall; and one or more electrodes disposed in the chamber sidewall and configured to ionize a treating gas coming from the inner chamber to generate plasma so as to clean off deposit produced in the inner chamber.
Bibliography:Application Number: US202117455994