Method of manufacturing devices

A method for analyzing a process, the method including obtaining a multi-dimensional probability density function representing an expected distribution of values for a plurality of process parameters; obtaining a performance function relating values of the process parameters to a performance metric...

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Bibliographic Details
Main Authors Menchtchikov, Boris, Van Der Straten, Koen Wilhelmus Cornelis Adrianus, Zou, Yi, Cheng, Yana, Tel, Wim Tjibbo, Hastings, Simon Philip Spencer, Lin, Chenxi, Slachter, Abraham, Slotboom, Daan Maurits, Genin, Maxime Philippe Frederic, Zhang, Youping, Timoshkov, Vadim Yourievich, Tabery, Cyrus Emil
Format Patent
LanguageEnglish
Published 23.07.2024
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
CONTROL OR REGULATING SYSTEMS IN GENERAL
CONTROLLING
ELECTROGRAPHY
FUNCTIONAL ELEMENTS OF SUCH SYSTEMS
HOLOGRAPHY
MATERIALS THEREFOR
MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
REGULATING
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Summary:A method for analyzing a process, the method including obtaining a multi-dimensional probability density function representing an expected distribution of values for a plurality of process parameters; obtaining a performance function relating values of the process parameters to a performance metric of the process; and using the performance function to map the probability density function to a performance probability function having the process parameters as arguments.
Bibliography:Application Number: US201917296316