Selective etch using a sacrificial mask

• Main Authors: Li, Da, Peter, Daniel, Yu, Jengyi, Tan, Samantha SiamHwa, Kabansky, Alexander, Lee, Younghee, Nardi, Katie
• Format: Patent
• Language: English
• Published: 02.07.2024
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

A method for selectively etching a silicon oxide region with respect to a lower oxygen silicon containing region is provided. A sacrificial mask selectively deposited on the lower oxygen silicon containing region with respect to the silicon oxide region. An atomic layer etch selectively etches the s...